Плазма
Integrated multi-filter fast switching device
Fermion designed a multi-filter fast switching device that can enable a variety of working gases (He, Ne, Ar, Kr, Xe...) to meet the needs of multi-photon energy output while keeping the vacuum degree of the cavity unchanged.
High purity gas path panel
Fermion designed a multi-gas panel to provide high-purity ultraviolet light source working gas better than 100ppt, including He, Ne, Ar, Kr, Xe... and other working gases, to improve photon resolution and extend the service life of the lamp head.
Remote low temperature plasma treatment machine
The new remote low-temperature plasma excitation technology developed independently is used to separate the plasma generation chamber and the processing chamber, solving many problems of traditional ionization technology. This product is a compact desktop plasma processor with a volume of 27L. It is suitable for processing small and medium-sized parts and items. According to different needs and process requirements, it can realize surface cleaning, surface modification, surface activation and other functions of the items. The processing process adopts automatic control. This plasma excitation technology can realize processing equipment with larger volume (more than one cubic meter), speed up the processing efficiency of the production line, and provide customized products according to different applications and process requirements.
High-efficiency RF plasma pyrolysis source
The high-efficiency RF plasma cracking source of Fe-Mian Instruments adopts original RF focusing excitation technology and 4 high-efficiency solid-state RF sources as driving power sources (13.56MHz/433MHz/915MHz/2450MHz). It does not require a complex RF matching network and can effectively improve the ionization efficiency of the gas. A small hole structure is set at the plasma outlet, and the stability and uniformity of the extracted atoms/ions are optimized by adjusting the small hole structure. Compared with the traditional RF plasma source, this cracking source can better control the beam instability caused by switching valves and switching RF. At the same time, this cracking source can produce different plasma sources such as nitrogen source, oxygen source and hydrogen source through the cracking of discharge cavities of different materials. It is widely used in nitride growth, nitrogen atom implantation and doping, oxide growth, oxygen atom implantation and doping, and hydrogen atom surface cleaning in molecular beam epitaxy systems (MBE).
High brightness multi-gas vacuum ultraviolet light source for mass spectrometry (BL-1030S)
The BL-1030S series vacuum ultraviolet light source independently designed by Fermion Instrument Technology Co., Ltd. uses a three-stage differential cavity, isolates the focusing capillary and the differential cavity through an ultra-high vacuum valve, and can use a variety of working gases such as Ar, Kr, Xe, N2, and H2, covering multiple photon energies of 30 nm-150 nm (41 eV-8.3 eV), and the photon flux reaches 1013 photons/s
High brightness monochromatic focused vacuum ultraviolet light source (BL-1200S)
Fermion BL1200S is a specially designed high-brightness multi-gas mixed vacuum ultraviolet light source, which includes a differential cavity, a monochromatic cavity, a multi-filter change device, and a gate valve that isolates the focusing capillary from the differential cavity. It can use a variety of working gases (He, Ne, Ar, Kr, Xe...) to meet the requirements of small light spot and small gas pressure increment.
High brightness monochromatic focused vacuum ultraviolet light source (BL-1100S)
Fermion BL-1100S is a specially designed high-brightness multi-gas mixed vacuum ultraviolet light source, which includes a differential cavity, a monochromatic cavity, and a gate valve that isolates the focusing capillary from the differential cavity. It can use a variety of working gases (He, Xe) to meet the requirements of small light spot and small gas pressure increment.
High brightness monochromatic focused vacuum ultraviolet light source (BL-1010S)
The FERMI BL-1010S focused vacuum ultraviolet light source has a special structural design and uses a three-stage differential cavity. The focusing capillary and the differential cavity are isolated by an ultra-high vacuum valve, which can make a variety of working gases (He, Ne, Ar, Kr, Xe...) meet the requirements of small light spot and small gas pressure increment.
High brightness multi-gas vacuum ultraviolet light source (BL-1000S)
FERMI BL-1000S vacuum ultraviolet light source is an ultra-high efficiency vacuum ultraviolet light source developed by Fermi Instruments based on the revolutionary local field plasma mechanism and solid-state radio frequency source technology. This vacuum ultraviolet light source has the characteristics of no electrode, low voltage, and long life. It can efficiently excite a variety of gas components (He, Ne, Ar, Kr, Xe...). Compared with vacuum ultraviolet light sources based on traditional plasma excitation, its efficiency is several orders of magnitude higher, and it has a wide range of applications in emission spectroscopy, mass spectrometry, atomic absorption spectroscopy, etc.
High beam current RF plasma source
FERMI-RFPS-200 is a new high-efficiency RF plasma source produced by Fermi Instruments. It can generate plasma in a vacuum chamber through a coil structure. The types of exciting gases include but are not limited to H2, N2, O2, rare gases, etc. It has better stability and more precise controllability. It is widely used in molecular beam epitaxy (MBE) systems for nitride growth, nitrogen atom implantation and doping, oxide growth, oxygen atom implantation and doping, hydride growth, and hydrogen atom surface cleaning.
Integrated multi-filter fast switching device
Fermion designed a multi-filter fast switching device that can enable a variety of working gases (He, Ne, Ar, Kr, Xe...) to meet the needs of multi-photon energy output while keeping the vacuum degree of the cavity unchanged.
High purity gas path panel
Fermion designed a multi-gas panel to provide high-purity ultraviolet light source working gas better than 100ppt, including He, Ne, Ar, Kr, Xe... and other working gases, to improve photon resolution and extend the service life of the lamp head.
Remote low temperature plasma treatment machine
The new remote low-temperature plasma excitation technology developed independently is used to separate the plasma generation chamber and the processing chamber, solving many problems of traditional ionization technology. This product is a compact desktop plasma processor with a volume of 27L. It is suitable for processing small and medium-sized parts and items. According to different needs and process requirements, it can realize surface cleaning, surface modification, surface activation and other functions of the items. The processing process adopts automatic control. This plasma excitation technology can realize processing equipment with larger volume (more than one cubic meter), speed up the processing efficiency of the production line, and provide customized products according to different applications and process requirements.
High-efficiency RF plasma pyrolysis source
The high-efficiency RF plasma cracking source of Fe-Mian Instruments adopts original RF focusing excitation technology and 4 high-efficiency solid-state RF sources as driving power sources (13.56MHz/433MHz/915MHz/2450MHz). It does not require a complex RF matching network and can effectively improve the ionization efficiency of the gas. A small hole structure is set at the plasma outlet, and the stability and uniformity of the extracted atoms/ions are optimized by adjusting the small hole structure. Compared with the traditional RF plasma source, this cracking source can better control the beam instability caused by switching valves and switching RF. At the same time, this cracking source can produce different plasma sources such as nitrogen source, oxygen source and hydrogen source through the cracking of discharge cavities of different materials. It is widely used in nitride growth, nitrogen atom implantation and doping, oxide growth, oxygen atom implantation and doping, and hydrogen atom surface cleaning in molecular beam epitaxy systems (MBE).
High brightness multi-gas vacuum ultraviolet light source for mass spectrometry (BL-1030S)
The BL-1030S series vacuum ultraviolet light source independently designed by Fermion Instrument Technology Co., Ltd. uses a three-stage differential cavity, isolates the focusing capillary and the differential cavity through an ultra-high vacuum valve, and can use a variety of working gases such as Ar, Kr, Xe, N2, and H2, covering multiple photon energies of 30 nm-150 nm (41 eV-8.3 eV), and the photon flux reaches 1013 photons/s
High brightness monochromatic focused vacuum ultraviolet light source (BL-1200S)
Fermion BL1200S is a specially designed high-brightness multi-gas mixed vacuum ultraviolet light source, which includes a differential cavity, a monochromatic cavity, a multi-filter change device, and a gate valve that isolates the focusing capillary from the differential cavity. It can use a variety of working gases (He, Ne, Ar, Kr, Xe...) to meet the requirements of small light spot and small gas pressure increment.
High brightness monochromatic focused vacuum ultraviolet light source (BL-1100S)
Fermion BL-1100S is a specially designed high-brightness multi-gas mixed vacuum ultraviolet light source, which includes a differential cavity, a monochromatic cavity, and a gate valve that isolates the focusing capillary from the differential cavity. It can use a variety of working gases (He, Xe) to meet the requirements of small light spot and small gas pressure increment.
High brightness monochromatic focused vacuum ultraviolet light source (BL-1010S)
The FERMI BL-1010S focused vacuum ultraviolet light source has a special structural design and uses a three-stage differential cavity. The focusing capillary and the differential cavity are isolated by an ultra-high vacuum valve, which can make a variety of working gases (He, Ne, Ar, Kr, Xe...) meet the requirements of small light spot and small gas pressure increment.
High brightness multi-gas vacuum ultraviolet light source (BL-1000S)
FERMI BL-1000S vacuum ultraviolet light source is an ultra-high efficiency vacuum ultraviolet light source developed by Fermi Instruments based on the revolutionary local field plasma mechanism and solid-state radio frequency source technology. This vacuum ultraviolet light source has the characteristics of no electrode, low voltage, and long life. It can efficiently excite a variety of gas components (He, Ne, Ar, Kr, Xe...). Compared with vacuum ultraviolet light sources based on traditional plasma excitation, its efficiency is several orders of magnitude higher, and it has a wide range of applications in emission spectroscopy, mass spectrometry, atomic absorption spectroscopy, etc.
High beam current RF plasma source
FERMI-RFPS-200 is a new high-efficiency RF plasma source produced by Fermi Instruments. It can generate plasma in a vacuum chamber through a coil structure. The types of exciting gases include but are not limited to H2, N2, O2, rare gases, etc. It has better stability and more precise controllability. It is widely used in molecular beam epitaxy (MBE) systems for nitride growth, nitrogen atom implantation and doping, oxide growth, oxygen atom implantation and doping, hydride growth, and hydrogen atom surface cleaning.